UHV Sputtering offers a physical vapor deposition (PVD) method for custom thin film coatings, using DC and RF magnetron sputtering. We process up to 300mm diameter and custom sizes. Please fill out the quote form with your requirements and a sales representative will respond in a timely manner.
UHV Sputtering offers a wide inventory of sputtering target materials. Process capability includes DC and RF magnetron sputtering. We process up to 300mm diameter wafers as well as numerous other substrate materials and custom sizes. Our coatings are achieved under tight controls in a class 100 clean room environment, using completely refurbished vacuum equipment.
Processing capabilities include PVD sputtering:
See available films
Annealing Capabilities
System Compatible Materials
Please contact us for all other materials and custom sizes.
Typical Specifications
Please contact us for all other capability information.
For more information, please contact our sales staff or submit an RFQ